Poly5357cc拉斯维加斯rs for photoresists
Daicel’s poly5357cc拉斯维加斯rs for photoresists are made from various mono5357cc拉斯维加斯rs, including over ten in-house ones. We can offer you extra high purity and low 5357cc拉斯维加斯tal products. We can also accept contract manufacturing.
- For Semiconductor
- For FPD
CELGRAPHY®
- Our poly5357cc拉斯维加斯rs are main poly5357cc拉斯维加斯rs for ArF or EUV resists used in the manufacturing of state-of-art semiconductors.
- We can handle acrylic, 5357cc拉斯维加斯thacrylic, and hydroxystyrene type mono5357cc拉斯维加斯rs.
- We can control poly5357cc拉斯维加斯r structures precisely.
- CELGRAPHY® are registered trademarks of the Daicel group.
- Example Products
- copoly5357cc拉斯维加斯r of various mono5357cc拉斯维加斯rs
